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WSH UV Disinfection System
WTV UV Disinfection Vertical System
ZL UV Disinfection System
Clear Medium Pressure UV Disinfection System
MOL Ceramic Plate CD Ozone Generator
UV-AOP Advanced Oxidation System
D.FITE Cloth Filter
ZL UV Disinfection System
Clear Medium Pressure UV Disinfection System
UV-AOP Advanced Oxidation
Extrem Medium Pressure UV Disinfection System
EX-U UV Sterilizer
EX-UPW-TOC UV TOC System
MOM Ceramic Plate CD Ozone Generator
MOS Ceramic Plate CD Ozone Generator
UV-Fenton
UV-Oxidation
EX-L UV Sterilizer
EX-U UV Sterilizer
ZL UV Disinfection System
CLEAR Medium pressure UV Disinfection System
OneUV UV Sterilizer
Extrem Medium pressure UV Disinfection System
UV-AOP Advanced Oxidation
MOS Ceramic Plate CD Ozone Generator
COG Ceramic Plate CD Ozone Generator
UV-Fenton
Medium-pressure UV-Oxidation
UV Photolysis
Pasteurization UV Alternatives
UV Photocatalysis
Low Pressure UV-Oxidation
AI Optical Sorter
Al high-speed sorting robot
AI heavy-duty sorting robot
SATBR Integrated Wastewater Treatment System
D.FITE Cloth Filter
Modular Wastewater Treatment System
ModuOzone Ceramic Plate CD Ozone Generator
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Zero Liquid Discharge (ZLD) has become a key option for China's future industrial green and low-carbon transformation.
ZLD aims to maximize the recycling of industrial wastewater through comprehensive water treatment technologies, minimizing or even eliminating final liquid waste.
Among the many technological pathways for achieving ZLD, advanced oxidation (UV-AOP) technology plays a crucial role.

UV-AOP technology, due to its ability to generate highly oxidizing hydroxyl radicals (.OH), is particularly suitable for treating difficult-to-degrade, highly toxic organic wastewaters in the chemical industry, such as those from fine chemicals, pesticides, dyes, and pharmaceutical intermediates.
UV-AOP is often used as a deep treatment or pretreatment unit to improve the biodegradability of wastewater, reducing the burden and toxicity impact of subsequent biological treatment.
The electronics manufacturing industry places extremely high demands on process water purity, and ultrapure water (UPW) is an indispensable key material in its production.
UPW has extremely strict control standards (such as SEMI standards) for ions, organic matter (TOC), microorganisms, particulate matter, and dissolved gases.
The wastewater generated during the electronics manufacturing process is complex in composition, some of which is highly toxic. Achieving zero discharge of electronic wastewater places even higher demands on UV advanced oxidation technology.
Ozone Generator Applications
Ultraviolet Advanced Oxidation (UV-AOP) Applications
UV Disinfection Applications
ZLD Applications:
UV disinfection is often used as a final safeguard before water reuse or in specific treatment steps (such as as an auxiliary means of TOC removal or to prevent biofilm growth).
Ozone is primarily used for deep oxidation (degradation of COD and TOC), decolorization, deodorization, and biodegradability in wastewater. It is also used as a component in certain advanced oxidation processes (such as O₃/H₂O₂).
UV-AOP is a key technology for the decomposition of recalcitrant organic pollutants. It can degrade these stubborn pollutants, thereby improving the treatment efficiency of the entire ZLD system and ensuring effluent quality.
Clear Medium Pressure UV Disinfection System
The ONYX-Clear-SZ in-line medium-pressure UV sterilizer utilizes medium-pressure multi-spectral UV lamps to not only destroy DNA/RNA but also intracellular enzymes and proteins, resulting in more thorough sterilization. It is designed to disinfect and degrade toxic micropollutants in water, including NDMA, 1,4-dioxane, endocrine disruptors (EDCs), pesticide residues, cyanobacterial toxins, GSM (geosmin), and 2-MIB (dimethylisoborneol).
In addition, combining oxidants such as O₃ and H₂O₂ with UV light, such as UV-O₃ and UV-H₂O₂ processes, can be used to oxidatively remove recalcitrant substances and organic matter, such as CC14 and polyaminobiphenyls, from wastewater.
MOL Ceramic Plate CD Ozone Generator
The ONYX-MOL plate-type ozone generator features a modular design that allows for block-type assembly based on gas production capacity, resulting in a compact structure.
Utilizing high-purity aluminum-based ceramic electrodes and a highly resistant micro-arc oxidation process, the system delivers stable and reliable performance with an ultra-low attenuation rate. Uniform micro-gap high-frequency discharge delivers energy savings of 20-35%. The ozone concentration is adjustable from 0 to 240 mg/L, saving up to 40% oxygen.
The power-on auto-start design eliminates the need for manual intervention. It features self-diagnosis during operation, error handling, and intelligent recovery. Edge computing and cloud service coordination are integrated for operational status.
UV-Fenton
Photo-Fenton is an advanced oxidation process (AOP) that combines the traditional Fenton reaction with photochemical excitation. It significantly enhances the oxidation capacity of the Fenton system through ultraviolet irradiation, achieving efficient mineralization of difficult-to-degrade organic pollutants. Its core principle is to utilize light energy to accelerate the circulation of iron ions and promote the generation of hydroxyl radicals (·OH). It offers significant advantages in reducing iron sludge production, increasing reaction rates, and lowering operating costs. It is particularly suitable for treating high-concentration, highly toxic industrial wastewater.
UV-AOP Advanced Oxidation
Ultraviolet Advanced Oxidation Process (UV-AOP) is an environmentally friendly technology that uses ultraviolet radiation to trigger oxidation reactions. Its core principle is to use UV light to excite oxidants to generate highly oxidizing free radicals, which in turn degrade organic and inorganic pollutants. UV-AOP is characterized by high efficiency, environmental friendliness, and zero secondary pollution. UV-AOP systems can be categorized into various types depending on the type of oxidant, the most common of which include UV/hydrogen peroxide, UV/ozone, and UV/chlorine.
ONYX-Clear-SZ-AOP can serve as the UV light source for UV-AOP. This UV-AOP system can be used to degrade toxic micropollutants such as nitrosodimethylamine, 1,4-dioxane, endocrine disrupting chemicals (EDCs), pesticide residues, cyanobacterial toxins, GSM (geosmin), and 2-MIB (dimethylisoborneol).

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